Nonvolatile memory device and fabrication method

ABSTRACT

Provided is a nonvolatile memory device and a fabrication method. The nonvolatile memory device includes an active region defined in a semiconductor substrate, a gate insulating layer formed on the active region and a plurality of gate patterns formed on the gate insulating layer, and crossing over the active region. The gate insulating layer includes a discharge region in a predetermined portion between the gate patterns, the discharge region having a lesser thickness than that of the gate insulating layer under the gate pattern, because a thickness portion of the gate insulating layer is removed to form the discharge region.

CROSS-REFERENCE TO RELATED APPLICATION

This is a divisional of application Ser. No. 11/641,869 filed on Dec. 20, 2006, which is incorporated herein by reference in its entirety.

BACKGROUND

1. Field of the Invention

The present invention relates to a semiconductor device and fabrication method. More particularly, the invention relates to a nonvolatile memory device and fabrication method.

This U.S. non-provisional patent application claims priority under 35 U.S.C. §119 of Korean Patent Application No. 2006-102375, filed on Oct. 20, 2006, the subject matter of which is hereby incorporated by reference.

2. Description of the Related Art

As semiconductor devices become more highly integrated, the planar surface area occupied by the patterns and components implementing such devices decreases. However, there are finite limits to similar reductions in the vertical height of these patterns and components. As a result, contemporary semiconductor devices are being fabricated with increasing vertical heights.

As a result of this phenomenon, some of the fabrication processes used to form highly integrated patterns having relatively large heights make use of high-energy plasma. Such processes often result in an accumulation of plasma ions and/or electrical charge on pattern elements and components. Such an accumulation of ions and charge can have detrimental effects on the overall performance characteristic transistors within the semiconductor device.

For example, in certain nonvolatile memory devices, programming and erase operations are performed via a tunnel insulating layer. High reliability of this tunnel insulating layer is essential to proper operation of the devices. Ions and/or charge accumulated on pattern elements and components may migrate into the tunnel insulating layer, thereby degrading its reliability and durability. The reliability and durability of the tunnel insulating layer influences the endurance, data retention and hot temperature storage properties of the constituent memory device. Therefore, any degradation in the reliability of the tunnel insulating layer (directly or indirectly) results in detrimental effects on the operation and durability of transistors.

Figures (FIGS. 1 through 3 are cross-sectional views illustrating a fabrication method for a conventional nonvolatile memory device.

Referring to FIG. 1, an active region (not shown) is defined on a semiconductor substrate 10. A gate insulating layer 12 and a floating gate layer 14 are stacked on the active region. A dielectric layer 22 and a control gate layer 24 are formed on floating gate layer 14, and a hard mask layer 26 is formed on control gate layer 24.

Referring to FIG. 2, hard mask layer 26, control gate layer 24 and dielectric layer 22 are sequentially patterned to form a hard mask pattern 26 a, a control gate electrode 24 a and an inter-gate dielectric layer 22 a under the control gate electrode 24 a which cross over the active region. Ions and/or charge may accumulate in floating gate layer 14 as well as control gate electrode 24 a and inter-gate dielectric layer 22 a during high-energy plasma fabrication processes. The accumulated ions and/or charge may migrate to and accumulate on gate insulating layer 12, thereby degrading the performances properties of gate insulating layer 12.

Referring to FIG. 3, floating gate layer 14 is etched using hard mask pattern 26 a as an etch mask to form a floating gate 14 a self-aligned with control gate electrode 24 a. During this process, plasma ions and/or charge may further accumulate on floating gate 14 a. As floating gate 14 a is formed in electrical isolation on the active region, any ions and/or charge accumulated on floating gate 14 a move towards semiconductor substrate 10 which has a relatively low voltage potential and become trapped by gate insulating layer 12. Trapped ions and/or charge interfere with control voltages applied to the various components of the constituent memory device.

SUMMARY OF THE INVENTION

Embodiments of the present invention provide a nonvolatile memory device having a structure capable of discharging any ions and/or charge accumulated during fabrication. Related fabrication methods are also provided.

In one embodiment, the invention provides a nonvolatile memory device, comprising; an active region defined in a semiconductor substrate, a gate insulating layer formed on the active region, and a plurality of gate patterns formed on the gate insulating layer and crossing over the active region, wherein the gate insulating layer comprises a discharge region disposed between adjacent gate patterns and having a thickness less than the thickness of a portion of the gate insulating layer under at least one of the plurality of gate patterns.

In another embodiment, the invention provides a nonvolatile memory device, comprising; an active region defined in a semiconductor substrate, a source region and a drain region formed in the active region, a gate insulating layer formed on the active region, a ground selection line and a string selection line disposed on the gate insulating layer between the source region and the drain region and crossing over an upper portion of the active region, and a plurality of word lines disposed on the gate insulating layer between the ground selection line and the string selection line, wherein the gate insulating layer comprises a discharge region on the source region and the drain region, the discharge region having a thickness less than the thickness of a portion of the gate insulating layer under the word line.

In another embodiment, the invention provides a fabrication method for a nonvolatile memory device, the method comprising; forming a device isolation layer on a semiconductor substrate to define an active region, forming a gate insulating layer and a first conductive layer pattern, which are stacked on the active region, etching the first conductive layer pattern to form an opening exposing the gate insulating layer, removing a thickness portion of the gate insulating layer exposed through the opening to form a discharge region, forming a second conductive layer pattern filling the opening in the first conductive layer pattern, forming a dielectric layer and a third conductive layer on the second conductive layer, and sequentially patterning the third conductive layer, the dielectric layer, the second conductive layer and the first conductive layer to form a plurality of gate patterns crossing over the active region.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1 through 3 are cross-sectional views illustrating a fabrication method for a conventional nonvolatile memory device;

FIG. 4A is a plan view of a nonvolatile memory device according to an embodiment of the invention;

FIG. 4B is a cross-sectional view taken along line I-I′ of FIG. 4A; and

FIGS. 5A, 5B and 5C and FIGS. 6 through 9 are views illustrating a fabrication method of a nonvolatile memory device according to an embodiment of the invention.

DESCRIPTION OF EMBODIMENTS

Embodiments of the invention will be described in some additional detail with reference to the accompanying drawings. The present invention may, however, be embodied in different forms and should not be constructed as limited to only the embodiments set forth herein. Rather, these embodiments are presented as teaching examples. Throughout the written description and drawings, like reference numbers refer to like or similar elements.

FIG. 4A is a plan view of a nonvolatile memory device according to an embodiment of the invention. FIG. 4B is a cross-sectional view taken along line I-I′ of FIG. 4A.

As illustrated in FIGS. 4A and 4B, an embodiment of the invention may be applied to a nonvolatile memory device having a NAND type cell array. However, the present invention is not limited to only this type of device but may be applied to any semiconductor device potentially requiring the discharge of ions and/or charge accumulated due to plasma damage. For example, the present invention may be applied to a nonvolatile memory device having the NOR type cell array as well as a NAND type cell array.

Referring to FIGS. 4A and 4B, the NAND type cell array includes a plurality of active regions defined on a semiconductor substrate. Active regions 51 may extend in parallel with each other in a row direction. Active regions 51 may be defined by a device isolation layer (not shown), such as a conventionally understood trench isolation structure.

A gate insulating layer 52 is formed on active regions 51. A plurality of gate patterns are disposed on gate insulating layer 52 and cross over active regions 51. In the NAND type cell array, the gate patterns include a ground selection line GSL and a string selection line SSL. Also, the gate patterns include a plurality of word lines WLn disposed between the ground selection line GSL and the string selection line SSL.

The cell array may include pluralities of the ground selection lines GSL and the string selection lines SSL, which are disposed in mirror symmetry. Thus, one ground selection line GSL may be adjacent to another ground selection line GSL, and one string selection line SSL may be adjacent to another string selection line SSL. A source region 69 s is formed in the active region between the ground selection lines GSL, and a drain region 69 d is formed in the active region between the string selection lines SSL. A common source line CSL, which crosses over active region 51 to connect source regions 69 s, is disposed between the ground selection lines GSL. A bit line plug connected to drain region 69 d is formed between the string selection lines SSL.

In an embodiment of the invention, gate insulating layer 52 is disposed on an entire surface of active region 51 as well as under the gate patterns. Gate insulating layer 52 includes a discharge region 58 a having a thickness that is thinner than that of another region on a predetermined portion between the gate patterns. Preferably, discharge region 58 a is formed on a region that does not influence the performance characteristics of a cell transistor. For example, in one embodiment, discharge region 58 a is formed at a portion of the device connected to an interconnection. In the NAND type cell array, discharge region 58 a may be formed in source region 69 s and drain region 69 d. In one embodiment, discharge region 58 a is separated from the adjacent ground and string selection lines GSL and SSL by predetermined distances.

Source region 69 a and drain region 69 d may include a doping layer 69 b having a junction with a depth different from others due to a thickness difference between discharge region 58 a and a peripheral region thereof. Therefore, doping layer 69 b has a greater depth to a lower portion of discharge region 58 a than the peripheral region. A cell diffusion layer 69 a is formed in active region 51 between the word lines WLn, between a first word line WL00 and the ground selection line GSL, and between a last word line WL31 and the string selection line SSL.

Space insulating layers 70 a are formed on sidewalls of the gate patterns. The space insulating layers 70 a are separated from each other between the ground selection lines GSL and between the string selection lines SSL. Meanwhile, the space insulating layers are in contact with each other between the word lines SSL to cover active regions 51 between the word lines WLn. Source region 69 s and drain region 69 d may further include a high concentration doping layer 69 c. High concentration doping layer 69 c may have a junction arranged in relation to an edge of space insulating layer 70 a.

Space insulating layer 70 a may cover a portion of discharge region 58 a. As the common source line CSL and a bit line contact DC are formed such that they are aligned with spacer insulating layers 70 a, the common source line CSL and a bit line contact DC are connected to the active region through discharge region 58 a. The common source line CSL and the bit line contact DC penetrate an interlayer insulating layer 72. A bit line BL connected to the bit line contact DC is formed on interlayer insulating layer 72 such that it may extend in parallel with the active region.

The word line WLn includes a floating gate 68 w formed on active region 51, a control gate electrode 64 a formed on floating gate 68 w and crossing over active region 51, and an inter-gate dielectric layer 62 a interposed between floating gate 68 w and control gate electrode 64 a. A hard mask pattern 66 a may remain on the control gate electrode 64 a. Floating gate 68 w may have a multi-stacked structure where a lower conductive layer pattern 54 a and an upper conductive layer pattern 60 a are stacked. Also, the floating gate is formed such that it is isolated in a region where the word line WLn and active region 51 intersected with each other.

Each of the ground and string selection lines GSL and SSL may include a lower selection gate 68 s, an upper selection gate 64 b and a dielectric layer pattern 62 b interposed therebetween. Lower selection gate 68 s and upper selection gate 64 b may cross over the active region or may be separated on active region 51. Dielectric layer pattern 62 b is interposed between portions of lower selection gate 68 s and upper selection gate 64 b such that upper selection gate 64 b and lower selection gate 68 s are connected.

FIGS. 5A, 5B, 5C and FIGS. 6 through 9 are views illustrating a fabrication method for a nonvolatile memory device according to an embodiment of the invention.

Referring to FIGS. 5A and 5B, a device isolation layer is formed on a semiconductor substrate 50 to define active regions 51. Active regions 51 extend in parallel with each other. A gate insulating layer 52 and a first conductive layer pattern 54 are formed on an active region 51. Gate insulating layer 52 and first conductive layer pattern 54 may be formed, for example, on active region 51 when a device isolation layer is formed using a self-aligned trench isolation technique.

A mask pattern 56 having an opening 58 exposing a predetermined portion of active region 51 is formed on first conductive layer pattern 54. Opening 58 may extend in a direction crossing active region 51.

First conductive layer pattern 54 is etched using mask pattern 56 as an etch mask to expose gate insulating layer 52. A defined portion of exposed gate insulating layer 52 is removed to form a thin discharge region 58 a of predetermined thickness.

As illustrated in FIG. 5C, a plurality of discharge regions 58 a may be formed within a cell array. In one embodiment, charge regions 58 a are formed at a portion where an interconnection is made in order to minimize factors that may influence the performance characteristics of associated transistors.

Referring to FIG. 6, mask pattern 56 is removed and a second conductive layer pattern 60 is formed on active region 51. The second conductive layer pattern 60 may extend along active region 51. Also, second conductive layer pattern 60 may be successively formed over a device isolation layer at a position where a ground selection line GSL and a string selection line SSL will subsequently be formed. The opening formed in first conductive layer pattern 54 is filled with second conductive layer pattern 60.

A dielectric layer 62 and a third conductive layer 64 may be formed on an entire surface of semiconductor substrate 50, including second conductive layer pattern 60. Also, a hard mask layer 66 may be formed on the third conductive layer

Referring to FIG. 7, hard mask layer 66, third conductive layer 64 and dielectric layer 62 are etched to form a hard mask pattern 66 a, a control gate electrode 64 a, an inter-gate dielectric layer 62 a in a region where word lines will be formed, and also form an upper selection gate 64 b and an inter-gate insulating layer 62 b in a region where the string and ground selection lines SSL and GSL will be formed. In an embodiment of the invention, ions and/or charge potentially accumulated due to plasma damage will be concentrated in discharge region 58 a, which has a relatively thin thickness and may thus be readily discharged to semiconductor substrate 50 through discharge region 58 a.

Referring to FIG. 8, first conductive layer pattern 54 and second conductive layer pattern 60 are etched using hard mask pattern 66 a as an etch mask to form a floating gate 68 w self-aligned with control gate electrode 64 a and a lower selection gate 68 s self-aligned with upper selection gate 64 b. As the result, a plurality of gate patterns may be formed on semiconductor substrate 50. The gate patterns include the ground selection line GSL and the string selection line SSL, which are disposed at both sides of the discharge regions 58 a, and also include word lines WLn disposed between the ground selection line GSL and the string selection line SSL. Any ions and/or charge accumulated during a process of forming the gate patterns will be concentrated into discharge region 58 a or may be discharged to semiconductor substrate 50 through discharge region 58 a.

Referring to FIG. 9, doping layers 69 a, 69 b and 69 c are formed on active region 51 between the gate patterns. Doping layer 69 a may have a depth difference corresponding to a thickness difference between discharge region 58 a and an associated peripheral region.

Space insulating layers 70 a and 70 b are formed on sidewalls of the gate patterns. Space insulating layer 70 a formed on sidewalls of the ground selection line GSL and the string selection line SSL may partially overlap discharge region 58 a. Space insulating layer 70 b between the word lines WLn may cover active region 51 between the word lines WLn. The high concentration doping layer 69 c is formed between the ground selection lines GSL and between the string selection lines SSL to form a source region 69 s and a drain region 69 d. The high concentration doping layer 69 c may have a junction aligned with an edge of space insulating layer 70 a.

Thereafter, an interlayer insulating layer 72 is formed, and a common source line CSL and a bit line contact DC are then formed. Subsequently, the bit line BL is formed to thereby obtain a structure illustrated in FIGS. 4A and 4B.

According to the embodiments of the invention described above, a predetermined thickness portion of the gate insulating layer is removed to form the discharge region having a relatively thin thickness. Due to this characteristic, ions and/or charge accumulated due to the plasma damage may be concentrated into the discharge region or discharged to the semiconductor substrate through the discharge region. Thus, it is possible to markedly reduce the likelihood of gate insulating layer degradation caused by the accumulation of ions and/or charge.

The above-disclosed subject matter is to be considered illustrative, and not restrictive, and the appended claims are intended to cover all modifications, enhancements, and other embodiments, which fall within the scope of the invention. Thus, to the maximum extent allowed by law, the scope of the present invention is to be determined by the broadest permissible interpretation of the following claims and their equivalents, and shall not be restricted or limited to only the foregoing embodiments. 

What is claimed is:
 1. A fabrication method for a nonvolatile memory device, the method comprising: forming a device isolation layer on a semiconductor substrate to define an active region; forming a gate insulating layer and a first conductive layer pattern, which are stacked on the active region; etching the first conductive layer pattern to form an opening exposing the gate insulating layer; removing a thickness portion of the gate insulating layer exposed through the opening to form a discharge region; forming a second conductive layer pattern filling the opening in the first conductive layer pattern; forming a dielectric layer and a third conductive layer on the second conductive layer; and sequentially patterning the third conductive layer, the dielectric layer, the second conductive layer and the first conductive layer to form a plurality of gate patterns crossing over the active region.
 2. The method of claim 1, wherein the discharge region is disposed between predetermined gate patterns.
 3. The method of claim 1, further comprising forming: an interconnection layer penetrating a portion of the discharge region and being connected to the active region.
 4. The method of claim 1, further comprising: implanting impurity ions in the active region between the gate patterns to form a doping layer, wherein a portion of the doping layer under the discharge region has a greater depth than portions of the doping layer proximate the discharge region.
 5. The method of claim 1, further comprising: forming a space insulating layer on sidewalls of the gate patterns, wherein the space insulating layer covers a portion of the discharge region.
 6. The nonvolatile memory device of claim 5, further comprising: forming a high concentration doping layer under the discharge region, the high concentration doping layer having a junction aligned with an edge of the space insulating layer.
 7. The method of claim 1, wherein the gate patterns comprise: a ground selection line and string selection line; and a plurality of word lines disposed between the ground selection line and the string selection line.
 8. The method of claim 7, wherein a plurality of discharge regions are formed on the active region, and the ground selection line, string selection line and the word lines are disposed between the discharge regions.
 9. The method of claim 8, further comprising: forming a source region in the active region adjacent to the ground selection line; and forming a drain region in the active region adjacent to the string selection line.
 10. The method of claim 8, wherein the source region and the drain region under the lower portion of the discharge region have a greater depth than that under the vicinity of the discharge region.
 11. The method of claim 8, further comprising: forming a common source line connected to the source line and crossing over the upper portion of the active region, and a bit line contact connected to the drain region.
 12. The method of claim 7, further comprising: forming a space insulating layer on sidewalls of the ground selection line, the string selection line and the word lines, wherein the space insulating layer covers a portion of the discharge region.
 13. The method of claim 12, further comprising: forming a source region and a drain region, which include a high concentration doping layer under the discharge region, the high concentration doping layer having a junction aligned with an edge of the space insulating layer. 